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Improving EUV imaging at tighter pitch using a tuned-ML mask stack

dc.contributor.authorWood, Obert
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorSoltwisch, Victor
dc.contributor.authorRaghunathan, Sudhar
dc.contributor.authorVerduijn, Erik
dc.contributor.authorHendrickx, Eric
dc.contributor.authorScholze, Frank
dc.contributor.authorMangat, Pawitter
dc.date.accessioned2021-10-22T08:25:09Z
dc.date.available2021-10-22T08:25:09Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24832
dc.sourceIIOimport
dc.titleImproving EUV imaging at tighter pitch using a tuned-ML mask stack
dc.typeOral presentation
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorVerduijn, Erik
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.source.peerreviewno
dc.source.conferenceInternational Symposium on EUVL
dc.source.conferencedate27/10/2014
dc.source.conferencelocationWashington USA
imec.availabilityPublished - imec


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