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High-Q photonic crystal nanocavities on 300 mm SOI substrate fabricated by 193 nm immersion lithography

dc.contributor.authorXie, Weiqiang
dc.contributor.authorFiers, Martin
dc.contributor.authorSelvaraja, Shankar
dc.contributor.authorBienstman, Peter
dc.contributor.authorVan Campenhout, Joris
dc.contributor.authorAbsil, Philippe
dc.contributor.authorVan Thourhout, Dries
dc.date.accessioned2021-10-22T08:31:58Z
dc.date.available2021-10-22T08:31:58Z
dc.date.issued2014
dc.identifier.issn0733-8724
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24844
dc.sourceIIOimport
dc.titleHigh-Q photonic crystal nanocavities on 300 mm SOI substrate fabricated by 193 nm immersion lithography
dc.typeJournal article
dc.contributor.imecauthorBienstman, Peter
dc.contributor.imecauthorVan Campenhout, Joris
dc.contributor.imecauthorAbsil, Philippe
dc.contributor.imecauthorVan Thourhout, Dries
dc.contributor.orcidimecBienstman, Peter::0000-0001-6259-464X
dc.contributor.orcidimecVan Campenhout, Joris::0000-0003-0778-2669
dc.contributor.orcidimecVan Thourhout, Dries::0000-0003-0111-431X
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage1457
dc.source.endpage1462
dc.source.journalJournal of Lightwave Technology
dc.source.issue8
dc.source.volume32
dc.identifier.urlhttp://ieeexplore.ieee.org/xpl/articleDetails.jsp?arnumber=6747322
imec.availabilityPublished - open access


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