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Innovative technological solutions for low-k integration beyond 10 nm

dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-22T18:31:22Z
dc.date.available2021-10-22T18:31:22Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24960
dc.sourceIIOimport
dc.titleInnovative technological solutions for low-k integration beyond 10 nm
dc.typeMeeting abstract
dc.source.peerreviewyes
dc.source.beginpage164
dc.source.conferenceAVS 62nd International Symposium & Exhibition
dc.source.conferencedate18/10/2015
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - imec


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