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Process and device modeling and characterization needs for deep submicron CMOS technology

dc.contributor.authorDe Meyer, Kristin
dc.date.accessioned2021-09-30T11:42:50Z
dc.date.available2021-09-30T11:42:50Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2499
dc.sourceIIOimport
dc.titleProcess and device modeling and characterization needs for deep submicron CMOS technology
dc.typeProceedings paper
dc.contributor.imecauthorDe Meyer, Kristin
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage22
dc.source.endpage28
dc.source.conference6th International Conference on Simulation of Devices and Technologies - ICSOT: Programme and Proceedings
dc.source.conferencedate14/10/1998
dc.source.conferencelocationCape Town South Africa
imec.availabilityPublished - open access


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