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Challenges for line width / line edge roughness (LWR/lER) improvement in Directed Self-Assembly (DSA) advanced patterning

dc.contributor.authorChan, BT
dc.contributor.authorPathangi Sriraman, Hari
dc.contributor.authorSingh, Arjun
dc.contributor.authorEl Otell, Ziad
dc.contributor.authorGronheid, Roel
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorPiumi, Daniele
dc.date.accessioned2021-10-22T18:38:24Z
dc.date.available2021-10-22T18:38:24Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25049
dc.sourceIIOimport
dc.titleChallenges for line width / line edge roughness (LWR/lER) improvement in Directed Self-Assembly (DSA) advanced patterning
dc.typeProceedings paper
dc.contributor.imecauthorChan, BT
dc.contributor.imecauthorSingh, Arjun
dc.contributor.imecauthorEl Otell, Ziad
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorPiumi, Daniele
dc.contributor.orcidimecChan, BT::0000-0003-2890-0388
dc.source.peerreviewno
dc.source.conferenceDSA Symposium
dc.source.conferencedate26/10/2015
dc.source.conferencelocationLeuven Belgium
imec.availabilityPublished - imec


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