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Standard cell design in N7: EUV vs. immersion

dc.contributor.authorChava, Bharani
dc.contributor.authorRio, David
dc.contributor.authorSherazi, Yasser
dc.contributor.authorTrivkovic, Darko
dc.contributor.authorGillijns, Werner
dc.contributor.authorDebacker, Peter
dc.contributor.authorRaghavan, Praveen
dc.contributor.authorElsaid, Ahmad
dc.contributor.authorDusa, Mircea
dc.contributor.authorMercha, Abdelkarim
dc.contributor.authorRyckaert, Julien
dc.contributor.authorVerkest, Diederik
dc.date.accessioned2021-10-22T18:38:44Z
dc.date.available2021-10-22T18:38:44Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25052
dc.sourceIIOimport
dc.titleStandard cell design in N7: EUV vs. immersion
dc.typeProceedings paper
dc.contributor.imecauthorRio, David
dc.contributor.imecauthorSherazi, Yasser
dc.contributor.imecauthorTrivkovic, Darko
dc.contributor.imecauthorGillijns, Werner
dc.contributor.imecauthorDebacker, Peter
dc.contributor.imecauthorDusa, Mircea
dc.contributor.imecauthorMercha, Abdelkarim
dc.contributor.imecauthorRyckaert, Julien
dc.contributor.imecauthorVerkest, Diederik
dc.contributor.orcidimecGillijns, Werner::0000-0002-2430-7360
dc.contributor.orcidimecDebacker, Peter::0000-0003-3825-5554
dc.contributor.orcidimecMercha, Abdelkarim::0000-0002-2174-6958
dc.contributor.orcidimecVerkest, Diederik::0000-0001-6567-2746
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage94270E
dc.source.conferenceDesign-Process-Technology Co-Optimization for Manufacturability IV
dc.source.conferencedate22/02/2015
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2210407
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 9427


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