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Understanding of Out-of-Band DUV light in EUV lithography: controlling impact on imaging and mitigation strategies

dc.contributor.authorDavydova, Natalia
dc.contributor.authorKottumakulal, Ram
dc.contributor.authorHageman, J.
dc.contributor.authorMcNamara, J.
dc.contributor.authorHoefnagels, Rik
dc.contributor.authorVaenkatesan, V.
dc.contributor.authorvan Dijk, Andre
dc.contributor.authorRicken, K.
dc.contributor.authorde Winter, L.
dc.contributor.authorDe Kruif, Robert
dc.contributor.authorJonckheere, Rik
dc.contributor.authorHollink, T.
dc.contributor.authorSchiffelers, Guido
dc.contributor.authorvan Setten, Eelco
dc.contributor.authorColsters, P.
dc.contributor.authorLiebregts, W.
dc.contributor.authorPellens1, Rudy
dc.contributor.authorvan Dijk, Joep
dc.date.accessioned2021-10-22T18:48:15Z
dc.date.available2021-10-22T18:48:15Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25124
dc.sourceIIOimport
dc.titleUnderstanding of Out-of-Band DUV light in EUV lithography: controlling impact on imaging and mitigation strategies
dc.typeProceedings paper
dc.contributor.imecauthorHoefnagels, Rik
dc.contributor.imecauthorvan Dijk, Andre
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorSchiffelers, Guido
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.source.peerreviewyes
dc.source.beginpage96610B
dc.source.conference31st European Mask and Lithography Conference
dc.source.conferencedate22/06/2015
dc.source.conferencelocationEindhoven Netherlands
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2436941&resultClick=1
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 9661


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