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Vacuum ultra-violet damage and damage mitigation for plasma processing of highly porous organosilicate glass dielectrics

dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorZhang, Liping
dc.contributor.authorHeyne, Markus
dc.contributor.authorLukaszewicz, Mikolasj
dc.contributor.authorPorter, Stephen Barry
dc.contributor.authorVajda, Felim
dc.contributor.authorRutigliani, Vito
dc.contributor.authorKrishtab, Mikhail
dc.contributor.authorGoodyear, Andy
dc.contributor.authorCooke, Mike
dc.contributor.authorVerdonck, Patrick
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-22T18:50:40Z
dc.date.available2021-10-22T18:50:40Z
dc.date.issued2015
dc.identifier.issn0021-8979
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25141
dc.sourceIIOimport
dc.titleVacuum ultra-violet damage and damage mitigation for plasma processing of highly porous organosilicate glass dielectrics
dc.typeJournal article
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorZhang, Liping
dc.contributor.imecauthorKrishtab, Mikhail
dc.contributor.imecauthorVerdonck, Patrick
dc.contributor.orcidimecVerdonck, Patrick::0000-0003-2454-0602
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage133302
dc.source.journalJournal of Applied Physics
dc.source.issue13
dc.source.volume118
dc.identifier.urlhttp://scitation.aip.org/content/aip/journal/jap/118/13/10.1063/1.4932202
imec.availabilityPublished - open access


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