dc.contributor.author | De Schepper, Peter | |
dc.contributor.author | El Otell, Ziad | |
dc.contributor.author | Vaglio Pret, Alessandro | |
dc.contributor.author | Altamirano Sanchez, Efrain | |
dc.contributor.author | De Gendt, Stefan | |
dc.date.accessioned | 2021-10-22T18:52:04Z | |
dc.date.available | 2021-10-22T18:52:04Z | |
dc.date.issued | 2015 | |
dc.identifier.issn | 1612-8850 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/25150 | |
dc.source | IIOimport | |
dc.title | The influence of H2 plasma treatment on LWR mitigation: the importance of EUV photoresist composition | |
dc.type | Journal article | |
dc.contributor.imecauthor | De Schepper, Peter | |
dc.contributor.imecauthor | El Otell, Ziad | |
dc.contributor.imecauthor | Vaglio Pret, Alessandro | |
dc.contributor.imecauthor | Altamirano Sanchez, Efrain | |
dc.contributor.imecauthor | De Gendt, Stefan | |
dc.contributor.orcidimec | De Gendt, Stefan::0000-0003-3775-3578 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 624 | |
dc.source.endpage | 641 | |
dc.source.journal | Plasma Processes and Polymers | |
dc.source.issue | 7 | |
dc.source.volume | 12 | |
dc.identifier.url | http://onlinelibrary.wiley.com/doi/10.1002/ppap.201400157/abstract | |
imec.availability | Published - imec | |