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The influence of H2 plasma treatment on LWR mitigation: the importance of EUV photoresist composition

dc.contributor.authorDe Schepper, Peter
dc.contributor.authorEl Otell, Ziad
dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorDe Gendt, Stefan
dc.date.accessioned2021-10-22T18:52:04Z
dc.date.available2021-10-22T18:52:04Z
dc.date.issued2015
dc.identifier.issn1612-8850
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25150
dc.sourceIIOimport
dc.titleThe influence of H2 plasma treatment on LWR mitigation: the importance of EUV photoresist composition
dc.typeJournal article
dc.contributor.imecauthorDe Schepper, Peter
dc.contributor.imecauthorEl Otell, Ziad
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewyes
dc.source.beginpage624
dc.source.endpage641
dc.source.journalPlasma Processes and Polymers
dc.source.issue7
dc.source.volume12
dc.identifier.urlhttp://onlinelibrary.wiley.com/doi/10.1002/ppap.201400157/abstract
imec.availabilityPublished - imec


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