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The influence of H2 plasma treatment on LWR mitigation: the importance of EUV photoresist composition
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Authors
De Schepper, Peter
;
El Otell, Ziad
;
Vaglio Pret, Alessandro
;
Altamirano Sanchez, Efrain
;
De Gendt, Stefan
ISSN
1612-8850
Issue
7
Journal
Plasma Processes and Polymers
Volume
12
Title
The influence of H2 plasma treatment on LWR mitigation: the importance of EUV photoresist composition
Publication type
Journal article
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