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The influence of H2 plasma treatment on LWR mitigation: the importance of EUV photoresist composition
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The influence of H2 plasma treatment on LWR mitigation: the importance of EUV photoresist composition
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Date
2015
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
De Schepper, Peter
;
El Otell, Ziad
;
Vaglio Pret, Alessandro
;
Altamirano Sanchez, Efrain
;
De Gendt, Stefan
Journal
Plasma Processes and Polymers
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1818
since deposited on 2021-10-22
2
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Acq. date: 2026-01-07
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Metrics
Views
1818
since deposited on 2021-10-22
2
last month
Acq. date: 2026-01-07
Citations