The influence of H2 plasma treatment on LWR mitigation: the importance of EUV photoresist composition

dc.contributor.author	De Schepper, Peter
dc.contributor.author	El Otell, Ziad
dc.contributor.author	Vaglio Pret, Alessandro
dc.contributor.author	Altamirano Sanchez, Efrain
dc.contributor.author	De Gendt, Stefan
dc.contributor.imecauthor	De Schepper, Peter
dc.contributor.imecauthor	El Otell, Ziad
dc.contributor.imecauthor	Vaglio Pret, Alessandro
dc.contributor.imecauthor	Altamirano Sanchez, Efrain
dc.contributor.imecauthor	De Gendt, Stefan
dc.contributor.orcidimec	De Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned	2021-10-22T18:52:04Z
dc.date.available	2021-10-22T18:52:04Z
dc.date.issued	2015
dc.identifier.issn	1612-8850
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/25150
dc.identifier.url	http://onlinelibrary.wiley.com/doi/10.1002/ppap.201400157/abstract
dc.source.beginpage	624
dc.source.endpage	641
dc.source.issue	7
dc.source.journal	Plasma Processes and Polymers
dc.source.volume	12
dc.title	The influence of H2 plasma treatment on LWR mitigation: the importance of EUV photoresist composition
dc.type	Journal article
dspace.entity.type	Publication
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