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Ar and H2 plasma and neutral/ion beam treatment of EUV resist

dc.contributor.authorDe Schepper, Peter
dc.contributor.authorMarinov, Daniil
dc.contributor.authorEl Otell, Ziad
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorBraithwaite, Nicholas St. J.
dc.date.accessioned2021-10-22T18:52:14Z
dc.date.available2021-10-22T18:52:14Z
dc.date.issued2015-03
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25151
dc.sourceIIOimport
dc.titleAr and H2 plasma and neutral/ion beam treatment of EUV resist
dc.typeProceedings paper
dc.contributor.imecauthorDe Schepper, Peter
dc.contributor.imecauthorEl Otell, Ziad
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage94280C
dc.source.conferenceAdvanced Etch Technology for Nanopatterning IV
dc.source.conferencedate22/02/2015
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2209850
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 9428


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