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XAS photoresists electron/quantum yields study with synchrotron light

dc.contributor.authorDe Schepper, Peter
dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorHansen, Terje
dc.contributor.authorGiglia, Angelo
dc.contributor.authorHoshiko, Kenji
dc.contributor.authorMani, Antonio
dc.contributor.authorBiafore, John J.
dc.date.accessioned2021-10-22T18:52:33Z
dc.date.available2021-10-22T18:52:33Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25153
dc.sourceIIOimport
dc.titleXAS photoresists electron/quantum yields study with synchrotron light
dc.typeProceedings paper
dc.contributor.imecauthorDe Schepper, Peter
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.contributor.imecauthorMani, Antonio
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage942507
dc.source.conferenceAdvances in Patterning Materials and Processes XXXII
dc.source.conferencedate22/02/2015
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2211082
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 9425


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