dc.contributor.author | De Simone, Danilo | |
dc.contributor.author | Pollentier, Ivan | |
dc.contributor.author | Vandenberghe, Geert | |
dc.date.accessioned | 2021-10-22T18:52:50Z | |
dc.date.available | 2021-10-22T18:52:50Z | |
dc.date.issued | 2015 | |
dc.identifier.issn | 0914-9244 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/25155 | |
dc.source | IIOimport | |
dc.title | Metal-containing materials as turning point of EUV lithography | |
dc.type | Journal article | |
dc.contributor.imecauthor | De Simone, Danilo | |
dc.contributor.imecauthor | Pollentier, Ivan | |
dc.contributor.imecauthor | Vandenberghe, Geert | |
dc.contributor.orcidimec | De Simone, Danilo::0000-0003-3927-5207 | |
dc.contributor.orcidimec | Pollentier, Ivan::0000-0002-4266-6500 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 507 | |
dc.source.endpage | 514 | |
dc.source.journal | Journal of Photopolymer Science and Technology | |
dc.source.issue | 4 | |
dc.source.volume | 28 | |
dc.identifier.url | https://www.jstage.jst.go.jp/article/photopolymer/28/4/28_507/_article | |
imec.availability | Published - open access | |