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Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: Impact of reducing agents

dc.contributor.authorDelabie, Annelies
dc.contributor.authorCaymax, Matty
dc.contributor.authorGroven, Benjamin
dc.contributor.authorHeyne, Markus
dc.contributor.authorHaesevoets, Karel
dc.contributor.authorMeersschaut, Johan
dc.contributor.authorNuytten, Thomas
dc.contributor.authorBender, Hugo
dc.contributor.authorConard, Thierry
dc.contributor.authorVerdonck, Patrick
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorHeyns, Marc
dc.contributor.authorBarla, Kathy
dc.contributor.authorRadu, Iuliana
dc.contributor.authorThean, Aaron
dc.date.accessioned2021-10-22T18:57:00Z
dc.date.available2021-10-22T18:57:00Z
dc.date.issued2015
dc.identifier.issn1359-7345
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25179
dc.sourceIIOimport
dc.titleLow temperature deposition of 2D WS2 layers from WF6 and H2S precursors: Impact of reducing agents
dc.typeJournal article
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorGroven, Benjamin
dc.contributor.imecauthorHaesevoets, Karel
dc.contributor.imecauthorMeersschaut, Johan
dc.contributor.imecauthorNuytten, Thomas
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorVerdonck, Patrick
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorBarla, Kathy
dc.contributor.imecauthorRadu, Iuliana
dc.contributor.imecauthorThean, Aaron
dc.contributor.orcidimecGroven, Benjamin::0000-0002-5781-7594
dc.contributor.orcidimecMeersschaut, Johan::0000-0003-2467-1784
dc.contributor.orcidimecNuytten, Thomas::0000-0002-5921-6928
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecVerdonck, Patrick::0000-0003-2454-0602
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecRadu, Iuliana::0000-0002-7230-7218
dc.source.peerreviewyes
dc.source.beginpage15692
dc.source.endpage15695
dc.source.journalChemical Communications
dc.source.issue86
dc.source.volume51
dc.identifier.urlhttp://pubs.rsc.org/en/content/articlelanding/2015/cc/c5cc05272f#!divAbstract
imec.availabilityPublished - imec


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