Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: Impact of reducing agents

Delabie, Annelies; Caymax, Matty; Groven, Benjamin; Heyne, Markus; Haesevoets, Karel; Meersschaut, Johan; Nuytten, Thomas; Bender, Hugo; Conard, Thierry; Verdonck, Patrick; Van Elshocht, Sven; De Gendt, Stefan; Heyns, Marc; Barla, Kathy; Radu, Iuliana; Thean, Aaron

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Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: Impact of reducing agents

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2015

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Chemical Communications

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1962 since deposited on 2021-10-22

Acq. date: 2026-02-24

Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: Impact of reducing agents

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