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Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: Impact of reducing agents
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Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: Impact of reducing agents
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Date
2015
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Delabie, Annelies
;
Caymax, Matty
;
Groven, Benjamin
;
Heyne, Markus
;
Haesevoets, Karel
;
Meersschaut, Johan
;
Nuytten, Thomas
;
Bender, Hugo
;
Conard, Thierry
;
Verdonck, Patrick
;
Van Elshocht, Sven
;
De Gendt, Stefan
;
Heyns, Marc
;
Barla, Kathy
;
Radu, Iuliana
;
Thean, Aaron
Journal
Chemical Communications
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1961
since deposited on 2021-10-22
Acq. date: 2025-12-17
Citations
Metrics
Views
1961
since deposited on 2021-10-22
Acq. date: 2025-12-17
Citations