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Development of a comprehensive metrology software platform dedicated to block copolymers thin film nanopatterns

dc.contributor.authorDerville, A.
dc.contributor.authorLabrosse, A.
dc.contributor.authorZimmermann, Y.
dc.contributor.authorFoucher, Johann
dc.contributor.authorSingh, Arjun
dc.contributor.authorGronheid, Roel
dc.date.accessioned2021-10-22T18:59:55Z
dc.date.available2021-10-22T18:59:55Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25194
dc.sourceIIOimport
dc.titleDevelopment of a comprehensive metrology software platform dedicated to block copolymers thin film nanopatterns
dc.typeProceedings paper
dc.contributor.imecauthorSingh, Arjun
dc.contributor.imecauthorGronheid, Roel
dc.source.peerreviewno
dc.source.conference1st International Symposium on DSA
dc.source.conferencedate26/10/2015
dc.source.conferencelocationLeuven Belgium
imec.availabilityPublished - imec


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