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Rapid thermal oxidation of porous silicon for surface passivation

dc.contributor.authorDebarge, L.
dc.contributor.authorStoquert, J. P.
dc.contributor.authorSlaoui, A.
dc.contributor.authorStalmans, Lieven
dc.contributor.authorPoortmans, Jef
dc.date.accessioned2021-09-30T11:46:53Z
dc.date.available2021-09-30T11:46:53Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2521
dc.sourceIIOimport
dc.titleRapid thermal oxidation of porous silicon for surface passivation
dc.typeJournal article
dc.contributor.imecauthorPoortmans, Jef
dc.contributor.orcidimecPoortmans, Jef::0000-0003-2077-2545
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage281
dc.source.endpage285
dc.source.journalMaterials Science in Semiconductor Processing
dc.source.volume1
imec.availabilityPublished - open access
imec.internalnotesSymposium I E-MRS Spring Meeting : Rapid Thermal Processing; June 1998; Strasbourg, France


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