dc.contributor.author | Debarge, L. | |
dc.contributor.author | Stoquert, J. P. | |
dc.contributor.author | Slaoui, A. | |
dc.contributor.author | Stalmans, Lieven | |
dc.contributor.author | Poortmans, Jef | |
dc.date.accessioned | 2021-09-30T11:46:53Z | |
dc.date.available | 2021-09-30T11:46:53Z | |
dc.date.issued | 1998 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/2521 | |
dc.source | IIOimport | |
dc.title | Rapid thermal oxidation of porous silicon for surface passivation | |
dc.type | Journal article | |
dc.contributor.imecauthor | Poortmans, Jef | |
dc.contributor.orcidimec | Poortmans, Jef::0000-0003-2077-2545 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 281 | |
dc.source.endpage | 285 | |
dc.source.journal | Materials Science in Semiconductor Processing | |
dc.source.volume | 1 | |
imec.availability | Published - open access | |
imec.internalnotes | Symposium I E-MRS Spring Meeting : Rapid Thermal Processing; June 1998; Strasbourg, France | |