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Implementation of surface energy modification in grapho-epitaxy directed self-assembly for hole multiplication

dc.contributor.authorDoise, Jan
dc.contributor.authorGronheid, Roel
dc.contributor.authorBekaert, Joost
dc.contributor.authorChan, BT
dc.contributor.authorCao, Yi
dc.contributor.authorGuanyang, Lin
dc.date.accessioned2021-10-22T19:04:48Z
dc.date.available2021-10-22T19:04:48Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25220
dc.sourceIIOimport
dc.titleImplementation of surface energy modification in grapho-epitaxy directed self-assembly for hole multiplication
dc.typeOral presentation
dc.contributor.imecauthorDoise, Jan
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorChan, BT
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.contributor.orcidimecChan, BT::0000-0003-2890-0388
dc.source.peerreviewno
dc.source.conference59th International Conference on Electroni Ion, and Photon Beam Technology and Nanofabrication - EIPB
dc.source.conferencedate26/05/2015
dc.source.conferencelocationSan Diego, CA USA
imec.availabilityPublished - imec


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