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Point-of-use filtration strategy for negative tone developer in extended immersion and extreme-ultraviolet (EUV) lithography

dc.contributor.authorD'Urzo, Lucia
dc.contributor.authorFoubert, Philippe
dc.contributor.authorStokes, Harold
dc.contributor.authorThouroude, Yan
dc.contributor.authorXia, A.
dc.contributor.authorWu, A.
dc.date.accessioned2021-10-22T19:07:39Z
dc.date.available2021-10-22T19:07:39Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25235
dc.sourceIIOimport
dc.titlePoint-of-use filtration strategy for negative tone developer in extended immersion and extreme-ultraviolet (EUV) lithography
dc.typeProceedings paper
dc.contributor.imecauthorD'Urzo, Lucia
dc.contributor.imecauthorFoubert, Philippe
dc.contributor.imecauthorStokes, Harold
dc.contributor.imecauthorThouroude, Yan
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage94251J
dc.source.conferenceAdvances in Patterning Materials and Processes XXXII
dc.source.conferencedate22/02/2015
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2211105
imec.availabilityPublished - open access


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