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Low damage cryoetching of low-K materials

dc.contributor.authorDussart, Remi
dc.contributor.authorTillocher, Thomas
dc.contributor.authorLeroy, Floriane
dc.contributor.authorLefaucheux, Philippe
dc.contributor.authoryatsuda, koichi
dc.contributor.authorMaekawa, Kaoru
dc.contributor.authorNishimura, Eiichi
dc.contributor.authorZhang, Liping
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-22T19:08:01Z
dc.date.available2021-10-22T19:08:01Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25237
dc.sourceIIOimport
dc.titleLow damage cryoetching of low-K materials
dc.typeMeeting abstract
dc.contributor.imecauthorZhang, Liping
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.source.peerreviewno
dc.source.beginpage162 (9428-20)
dc.source.conferenceSPIE Advanced Lithograply
dc.source.conferencedate22/02/2015
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - imec


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