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Development of a novel wafer-probe for in situ measurements of thin film properties

dc.contributor.authorEl Otell, Ziad
dc.contributor.authorMarinov, Daniil
dc.contributor.authorSamara, Vladimir
dc.contributor.authorBowden, Mark
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorVerdonck, Patrick
dc.contributor.authorBraithwaite, Nicholas St. J.
dc.date.accessioned2021-10-22T19:10:33Z
dc.date.available2021-10-22T19:10:33Z
dc.date.issued2015
dc.identifier.issn0963-0252
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25249
dc.sourceIIOimport
dc.titleDevelopment of a novel wafer-probe for in situ measurements of thin film properties
dc.typeJournal article
dc.contributor.imecauthorEl Otell, Ziad
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorVerdonck, Patrick
dc.contributor.orcidimecVerdonck, Patrick::0000-0003-2454-0602
dc.source.peerreviewyes
dc.source.beginpage32002
dc.source.journalPlasma Sources Science and Technology
dc.source.issue3
dc.source.volume24
dc.identifier.urlhttp://iopscience.iop.org/0963-0252/24/3/032002/
imec.availabilityPublished - imec


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