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Vacuum ultra-violet emission of CF4 & CF3I containing plasmas and their effect on low-k materials

dc.contributor.authorEl Otell, Ziad
dc.contributor.authorSamara, Vladimir
dc.contributor.authorZotovich, Alexey
dc.contributor.authorHansen, Terje
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-22T19:10:57Z
dc.date.available2021-10-22T19:10:57Z
dc.date.issued2015
dc.identifier.issn0022-3727
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25251
dc.sourceIIOimport
dc.titleVacuum ultra-violet emission of CF4 & CF3I containing plasmas and their effect on low-k materials
dc.typeJournal article
dc.contributor.imecauthorEl Otell, Ziad
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.source.peerreviewyes
dc.source.beginpage395202
dc.source.journalJournal of Physics D: Applied Physics
dc.source.issue39
dc.source.volume48
dc.identifier.urlhttp://iopscience.iop.org/article/10.1088/0022-3727/48/39/395202
imec.availabilityPublished - imec


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