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Scalpel Soft Retrace Scanning Spreading Resistance microscopy for 3D-carrier profiling in sub 10-nm WFIN FinFETs

dc.contributor.authorEyben, Pierre
dc.contributor.authorChiarella, Thomas
dc.contributor.authorKubicek, Stefan
dc.contributor.authorBender, Hugo
dc.contributor.authorRichard, Olivier
dc.contributor.authorMitard, Jerome
dc.contributor.authorMocuta, Anda
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorThean, Aaron
dc.date.accessioned2021-10-22T19:12:47Z
dc.date.available2021-10-22T19:12:47Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25260
dc.sourceIIOimport
dc.titleScalpel Soft Retrace Scanning Spreading Resistance microscopy for 3D-carrier profiling in sub 10-nm WFIN FinFETs
dc.typeProceedings paper
dc.contributor.imecauthorEyben, Pierre
dc.contributor.imecauthorChiarella, Thomas
dc.contributor.imecauthorKubicek, Stefan
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorMitard, Jerome
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorThean, Aaron
dc.contributor.orcidimecChiarella, Thomas::0000-0002-6155-9030
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.contributor.orcidimecMitard, Jerome::0000-0002-7422-079X
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage350
dc.source.endpage353
dc.source.conferenceIEEE International Electron Devices Meeting - IEDM
dc.source.conferencedate7/12/2015
dc.source.conferencelocationWashington, D.C. USA
imec.availabilityPublished - open access


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