dc.contributor.author | Gallagher, Emily | |
dc.contributor.author | Vanpaemel, Johannes | |
dc.contributor.author | Pollentier, Ivan | |
dc.contributor.author | Zahedmanesh, Houman | |
dc.contributor.author | Adelmann, Christoph | |
dc.contributor.author | Huyghebaert, Cedric | |
dc.contributor.author | Jonckheere, Rik | |
dc.contributor.author | Lee, Jae Uk | |
dc.date.accessioned | 2021-10-22T19:17:35Z | |
dc.date.available | 2021-10-22T19:17:35Z | |
dc.date.issued | 2015 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/25282 | |
dc.source | IIOimport | |
dc.title | Properties and performance of EUVL pellicle membranes | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Gallagher, Emily | |
dc.contributor.imecauthor | Pollentier, Ivan | |
dc.contributor.imecauthor | Zahedmanesh, Houman | |
dc.contributor.imecauthor | Adelmann, Christoph | |
dc.contributor.imecauthor | Huyghebaert, Cedric | |
dc.contributor.imecauthor | Jonckheere, Rik | |
dc.contributor.imecauthor | Lee, Jae Uk | |
dc.contributor.orcidimec | Gallagher, Emily::0000-0002-2927-8298 | |
dc.contributor.orcidimec | Pollentier, Ivan::0000-0002-4266-6500 | |
dc.contributor.orcidimec | Adelmann, Christoph::0000-0002-4831-3159 | |
dc.contributor.orcidimec | Huyghebaert, Cedric::0000-0001-6043-7130 | |
dc.contributor.orcidimec | Jonckheere, Rik::0000-0003-2211-9443 | |
dc.contributor.orcidimec | Lee, Jae Uk::0000-0002-9434-5055 | |
dc.source.peerreview | no | |
dc.source.beginpage | 96350X | |
dc.source.conference | SPIE Photomask Technology | |
dc.source.conferencedate | 29/09/2015 | |
dc.source.conferencelocation | Monterey, CA USA | |
dc.identifier.url | http://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2467012 | |
imec.availability | Published - imec | |
imec.internalnotes | Procedings of SPIE; Vol. 9635 | |