dc.contributor.author | Gallagher, Emily | |
dc.contributor.author | Vanpaemel, Johannes | |
dc.contributor.author | Pollentier, Ivan | |
dc.contributor.author | Zahedmanesh, Houman | |
dc.contributor.author | Adelmann, Christoph | |
dc.contributor.author | Huyghebaert, Cedric | |
dc.contributor.author | Jonckheere, Rik | |
dc.contributor.author | Lee, Jae Uk | |
dc.date.accessioned | 2021-10-22T19:17:48Z | |
dc.date.available | 2021-10-22T19:17:48Z | |
dc.date.issued | 2015 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/25283 | |
dc.source | IIOimport | |
dc.title | Properties and performance of EUVL pellicle membranes | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Gallagher, Emily | |
dc.contributor.imecauthor | Pollentier, Ivan | |
dc.contributor.imecauthor | Zahedmanesh, Houman | |
dc.contributor.imecauthor | Adelmann, Christoph | |
dc.contributor.imecauthor | Huyghebaert, Cedric | |
dc.contributor.imecauthor | Jonckheere, Rik | |
dc.contributor.imecauthor | Lee, Jae Uk | |
dc.contributor.orcidimec | Gallagher, Emily::0000-0002-2927-8298 | |
dc.contributor.orcidimec | Pollentier, Ivan::0000-0002-4266-6500 | |
dc.contributor.orcidimec | Adelmann, Christoph::0000-0002-4831-3159 | |
dc.contributor.orcidimec | Huyghebaert, Cedric::0000-0001-6043-7130 | |
dc.contributor.orcidimec | Jonckheere, Rik::0000-0003-2211-9443 | |
dc.contributor.orcidimec | Lee, Jae Uk::0000-0002-9434-5055 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.conference | International Symposium on Extreme Ultraviolet Lithography | |
dc.source.conferencedate | 5/10/2015 | |
dc.source.conferencelocation | Maastricht The Netherlands | |
dc.identifier.url | http://euvlsymposium.lbl.gov/pdf/2015/Oral_Wednesday/Session10_Pellicle,%20Mask%20Cleaning%20and%20Thermal%20Expansion/S10.3_Gal | |
imec.availability | Published - open access | |