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dc.contributor.authorGallagher, Emily
dc.contributor.authorVanpaemel, Johannes
dc.contributor.authorPollentier, Ivan
dc.contributor.authorZahedmanesh, Houman
dc.contributor.authorAdelmann, Christoph
dc.contributor.authorHuyghebaert, Cedric
dc.contributor.authorJonckheere, Rik
dc.contributor.authorLee, Jae Uk
dc.date.accessioned2021-10-22T19:17:48Z
dc.date.available2021-10-22T19:17:48Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25283
dc.sourceIIOimport
dc.titleProperties and performance of EUVL pellicle membranes
dc.typeProceedings paper
dc.contributor.imecauthorGallagher, Emily
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorZahedmanesh, Houman
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorHuyghebaert, Cedric
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorLee, Jae Uk
dc.contributor.orcidimecGallagher, Emily::0000-0002-2927-8298
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimecHuyghebaert, Cedric::0000-0001-6043-7130
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecLee, Jae Uk::0000-0002-9434-5055
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conferenceInternational Symposium on Extreme Ultraviolet Lithography
dc.source.conferencedate5/10/2015
dc.source.conferencelocationMaastricht The Netherlands
dc.identifier.urlhttp://euvlsymposium.lbl.gov/pdf/2015/Oral_Wednesday/Session10_Pellicle,%20Mask%20Cleaning%20and%20Thermal%20Expansion/S10.3_Gal
imec.availabilityPublished - open access


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