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Implementation of templated DSA for via layer patterning at the 7 nm node

dc.contributor.authorGronheid, Roel
dc.contributor.authorDoise, Jan
dc.contributor.authorBekaert, Joost
dc.contributor.authorChan, BT
dc.contributor.authorKarageorgos, Ioannis
dc.contributor.authorRyckaert, Julien
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorCao, Yi
dc.contributor.authorLin, G.
dc.contributor.authorSomervell, Mark
dc.contributor.authorFenger, Germain
dc.contributor.authorFuchimoto, Daisuke
dc.date.accessioned2021-10-22T19:31:16Z
dc.date.available2021-10-22T19:31:16Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25340
dc.sourceIIOimport
dc.titleImplementation of templated DSA for via layer patterning at the 7 nm node
dc.typeProceedings paper
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorDoise, Jan
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorChan, BT
dc.contributor.imecauthorRyckaert, Julien
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.contributor.orcidimecChan, BT::0000-0003-2890-0388
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage942305
dc.source.conferenceAlternative Lithographic Technologies VII
dc.source.conferencedate23/02/2015
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2210730
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 9423


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