Show simple item record

Numerical investigation of HBr/He transformer coupled plasmas used for silicon etching

dc.contributor.authorGul, Banat
dc.contributor.authorTinck, Stefan
dc.contributor.authorDe Schepper, Peter
dc.contributor.authorRehman, Aman-ur
dc.date.accessioned2021-10-22T19:32:33Z
dc.date.available2021-10-22T19:32:33Z
dc.date.issued2015
dc.identifier.issn0022-3727
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25345
dc.sourceIIOimport
dc.titleNumerical investigation of HBr/He transformer coupled plasmas used for silicon etching
dc.typeJournal article
dc.contributor.imecauthorDe Schepper, Peter
dc.source.peerreviewyes
dc.source.beginpage25202
dc.source.journalJournal of Physics D: Applied Physics
dc.source.issue2
dc.source.volume48
dc.identifier.urlhttp://iopscience.iop.org/0022-3727/48/2/025202/
imec.availabilityPublished - imec


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record