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dc.contributor.authorHan, Jeong Hwan
dc.contributor.authorDelabie, Annelies
dc.contributor.authorFranquet, Alexis
dc.contributor.authorConard, Thierry
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorAdelmann, Christoph
dc.date.accessioned2021-10-22T19:35:54Z
dc.date.available2021-10-22T19:35:54Z
dc.date.issued2015-12
dc.identifier.issn0948-1907
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25358
dc.sourceIIOimport
dc.titleOzone-based atomic layer deposition of Gd2O3 from tris(isopropyl-cyclopentadienyl) gadolinium: growth characteristics and surface chemistry
dc.typeJournal article
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.source.peerreviewyes
dc.source.beginpage352
dc.source.endpage359
dc.source.journalChemical Vapor Deposition
dc.source.issue10_12
dc.source.volume21
dc.identifier.urlhttp://onlinelibrary.wiley.com/doi/10.1002/cvde.201507196/abstract
imec.availabilityPublished - imec


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