dc.contributor.author | Han, Jeong Hwan | |
dc.contributor.author | Delabie, Annelies | |
dc.contributor.author | Franquet, Alexis | |
dc.contributor.author | Conard, Thierry | |
dc.contributor.author | Van Elshocht, Sven | |
dc.contributor.author | Adelmann, Christoph | |
dc.date.accessioned | 2021-10-22T19:35:54Z | |
dc.date.available | 2021-10-22T19:35:54Z | |
dc.date.issued | 2015-12 | |
dc.identifier.issn | 0948-1907 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/25358 | |
dc.source | IIOimport | |
dc.title | Ozone-based atomic layer deposition of Gd2O3 from tris(isopropyl-cyclopentadienyl) gadolinium: growth characteristics and surface chemistry | |
dc.type | Journal article | |
dc.contributor.imecauthor | Delabie, Annelies | |
dc.contributor.imecauthor | Franquet, Alexis | |
dc.contributor.imecauthor | Conard, Thierry | |
dc.contributor.imecauthor | Van Elshocht, Sven | |
dc.contributor.imecauthor | Adelmann, Christoph | |
dc.contributor.orcidimec | Franquet, Alexis::0000-0002-7371-8852 | |
dc.contributor.orcidimec | Conard, Thierry::0000-0002-4298-5851 | |
dc.contributor.orcidimec | Van Elshocht, Sven::0000-0002-6512-1909 | |
dc.contributor.orcidimec | Adelmann, Christoph::0000-0002-4831-3159 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 352 | |
dc.source.endpage | 359 | |
dc.source.journal | Chemical Vapor Deposition | |
dc.source.issue | 10_12 | |
dc.source.volume | 21 | |
dc.identifier.url | http://onlinelibrary.wiley.com/doi/10.1002/cvde.201507196/abstract | |
imec.availability | Published - imec | |