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dc.contributor.authorHeyne, Markus
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorMeersschaut, Johan
dc.contributor.authorNuytten, Thomas
dc.contributor.authorRadu, Iuliana
dc.contributor.authorNeyts, Erik C.
dc.contributor.authorBogaerts, Annemie
dc.contributor.authorDe Gendt, Stefan
dc.date.accessioned2021-10-22T19:41:43Z
dc.date.available2021-10-22T19:41:43Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25382
dc.sourceIIOimport
dc.titleInvestigations on the plasma-surface interaction during atomic layer etching of thin transition-metal dichalcogenide films
dc.typeProceedings paper
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorMeersschaut, Johan
dc.contributor.imecauthorNuytten, Thomas
dc.contributor.imecauthorRadu, Iuliana
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecMeersschaut, Johan::0000-0003-2467-1784
dc.contributor.orcidimecNuytten, Thomas::0000-0002-5921-6928
dc.contributor.orcidimecRadu, Iuliana::0000-0002-7230-7218
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewyes
dc.source.conference22nd International Symposium on Plasma Chemistry
dc.source.conferencedate5/07/2015
dc.source.conferencelocationAntwerp Belgium
imec.availabilityPublished - imec


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