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Hexagonal boron nitride nanowalls deposited by unbalanced magnetron RF sputtering

dc.contributor.authorHoang, Duc
dc.contributor.authorPobedinskas, Maulius
dc.contributor.authorJanssens, Stoffel
dc.contributor.authorTurner, Stuart
dc.contributor.authorHardy, An
dc.contributor.authorVerbeeck, J.
dc.contributor.authorVan Bael, Marlies
dc.contributor.authorD'Haen, Jan
dc.contributor.authorHaenen, Ken
dc.date.accessioned2021-10-22T19:43:14Z
dc.date.available2021-10-22T19:43:14Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25388
dc.sourceIIOimport
dc.titleHexagonal boron nitride nanowalls deposited by unbalanced magnetron RF sputtering
dc.typeOral presentation
dc.contributor.imecauthorHardy, An
dc.contributor.imecauthorVan Bael, Marlies
dc.contributor.imecauthorD'Haen, Jan
dc.contributor.imecauthorHaenen, Ken
dc.contributor.orcidimecVan Bael, Marlies::0000-0002-5516-7962
dc.contributor.orcidimecHaenen, Ken::0000-0001-6711-7367
dc.source.peerreviewno
dc.source.conferenceInnovations in Thin Films Processing and Characterisation
dc.source.conferencedate16/11/2015
dc.source.conferencelocationNancy France
imec.availabilityPublished - imec


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