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Deposition of O atomic layers on Si(100) substrates for epitaxial Si-O superlattices: investigation of the surface chemistry

dc.contributor.authorJayachandran, Suseendran
dc.contributor.authorDelabie, Annelies
dc.contributor.authorBillen, Arne
dc.contributor.authorDekkers, Harold
dc.contributor.authorDouhard, Bastien
dc.contributor.authorConard, Thierry
dc.contributor.authorMeersschaut, Johan
dc.contributor.authorCaymax, Matty
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-22T19:54:18Z
dc.date.available2021-10-22T19:54:18Z
dc.date.issued2015
dc.identifier.issn0169-4332
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25427
dc.sourceIIOimport
dc.titleDeposition of O atomic layers on Si(100) substrates for epitaxial Si-O superlattices: investigation of the surface chemistry
dc.typeJournal article
dc.contributor.imecauthorJayachandran, Suseendran
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorDekkers, Harold
dc.contributor.imecauthorDouhard, Bastien
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorMeersschaut, Johan
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecDekkers, Harold::0000-0003-4778-5709
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecMeersschaut, Johan::0000-0003-2467-1784
dc.source.peerreviewyes
dc.source.beginpage251
dc.source.endpage257
dc.source.journalApplied Surface Science
dc.source.volume324
dc.identifier.urlhttp://www.sciencedirect.com/science/article/pii/S0169433214023265
imec.availabilityPublished - imec


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