Show simple item record

Defectivity evaluation of EUV reticles with etched multilayer image border by wafer printing analysis

dc.contributor.authorJonckheere, Rik
dc.contributor.authorVerduijn, Erik
dc.contributor.authorWatanabe, Genta
dc.contributor.authorFukugami, Norihito
dc.contributor.authorSakata, Yo
dc.contributor.authorKodera, Yutaka
dc.contributor.authorGallagher, Emily
dc.date.accessioned2021-10-22T19:57:50Z
dc.date.available2021-10-22T19:57:50Z
dc.date.issued2015-07
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25439
dc.sourceIIOimport
dc.titleDefectivity evaluation of EUV reticles with etched multilayer image border by wafer printing analysis
dc.typeProceedings paper
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorVerduijn, Erik
dc.contributor.imecauthorGallagher, Emily
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecGallagher, Emily::0000-0002-2927-8298
dc.source.peerreviewyes
dc.source.beginpage96580H
dc.source.conferencePhotomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
dc.source.conferencedate20/04/2015
dc.source.conferencelocationYokohama Japan
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2397266&resultClick=1
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 9658


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record