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SrTiOx for sub-20 nm DRAM technology nodes - characterization and modeling

dc.contributor.authorKaczer, Ben
dc.contributor.authorLarcher, Luca
dc.contributor.authorVandelli, Luca
dc.contributor.authorReisinger, Hans
dc.contributor.authorPopovici, Mihaela Ioana
dc.contributor.authorClima, Sergiu
dc.contributor.authorJi, Zhigang
dc.contributor.authorJoshi, Saumya
dc.contributor.authorSwerts, Johan
dc.contributor.authorRedolfi, Augusto
dc.contributor.authorAfanasiev, Valeri
dc.contributor.authorJurczak, Gosia
dc.date.accessioned2021-10-22T20:00:47Z
dc.date.available2021-10-22T20:00:47Z
dc.date.issued2015
dc.identifier.issn0167-9317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25448
dc.sourceIIOimport
dc.titleSrTiOx for sub-20 nm DRAM technology nodes - characterization and modeling
dc.typeJournal article
dc.contributor.imecauthorKaczer, Ben
dc.contributor.imecauthorPopovici, Mihaela Ioana
dc.contributor.imecauthorClima, Sergiu
dc.contributor.imecauthorSwerts, Johan
dc.contributor.imecauthorRedolfi, Augusto
dc.contributor.imecauthorAfanasiev, Valeri
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.orcidimecKaczer, Ben::0000-0002-1484-4007
dc.contributor.orcidimecClima, Sergiu::0000-0002-4044-9975
dc.source.peerreviewyes
dc.source.beginpage126
dc.source.endpage129
dc.source.journalMicroelectronic Engineering
dc.source.volume147
dc.identifier.urlhttp://www.sciencedirect.com/science/article/pii/S0167931715002956
imec.availabilityPublished - imec
imec.internalnotesPaper from INFOS 2015


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