Show simple item record

A way to integrate multiple block layers for middle of line contact patterning

dc.contributor.authorKunnen, Eddy
dc.contributor.authorDemuynck, Steven
dc.contributor.authorBrouri, Mohand
dc.contributor.authorBoemmels, Juergen
dc.contributor.authorVersluijs, Janko
dc.contributor.authorRyckaert, Julien
dc.date.accessioned2021-10-22T20:17:21Z
dc.date.available2021-10-22T20:17:21Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25502
dc.sourceIIOimport
dc.titleA way to integrate multiple block layers for middle of line contact patterning
dc.typeProceedings paper
dc.contributor.imecauthorDemuynck, Steven
dc.contributor.imecauthorBoemmels, Juergen
dc.contributor.imecauthorVersluijs, Janko
dc.contributor.imecauthorRyckaert, Julien
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage94280W
dc.source.conferenceAdvanced Etch Technology for Nanopattering IV
dc.source.conferencedate22/02/2015
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2209862
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 9428


Files in this item

Thumbnail
Name:
30390.pdf
Size:
831.4Kb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record