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EUV patterning improvement toward high-volume manufacturing

dc.contributor.authorKuwahara, Yuhei
dc.contributor.authorMatsunaga, Koichi
dc.contributor.authorKawakami, Shinichiro
dc.contributor.authorNafus, Kathleen
dc.contributor.authorFoubert, Philippe
dc.contributor.authorGoethals, Mieke
dc.date.accessioned2021-10-22T20:17:39Z
dc.date.available2021-10-22T20:17:39Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25503
dc.sourceIIOimport
dc.titleEUV patterning improvement toward high-volume manufacturing
dc.typeMeeting abstract
dc.contributor.imecauthorNafus, Kathleen
dc.contributor.imecauthorFoubert, Philippe
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage94221X
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography VI
dc.source.conferencedate22/02/2015
dc.source.conferencelocationSan Jose, CX USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2210851
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 9422


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