dc.contributor.author | Leray, Philippe | |
dc.contributor.author | Jehoul, Christiane | |
dc.contributor.author | Inoue, Osamu | |
dc.contributor.author | Okagawa, Yutaka | |
dc.date.accessioned | 2021-10-22T20:25:09Z | |
dc.date.available | 2021-10-22T20:25:09Z | |
dc.date.issued | 2015 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/25527 | |
dc.source | IIOimport | |
dc.title | Hybrid overlay metrology with CDSEM in a BEOL patterning scheme | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Leray, Philippe | |
dc.contributor.imecauthor | Jehoul, Christiane | |
dc.source.peerreview | yes | |
dc.source.beginpage | 942408 | |
dc.source.conference | Metrology, Inspection, and Process Control for Microlithography XXIX | |
dc.source.conferencedate | 22/02/2015 | |
dc.source.conferencelocation | San Jose, CA USA | |
dc.identifier.url | http://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2210946 | |
imec.availability | Published - imec | |
imec.internalnotes | Proceedings of SPIE; Vol. 9424 | |