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Hybrid overlay metrology with CDSEM in a BEOL patterning scheme

dc.contributor.authorLeray, Philippe
dc.contributor.authorJehoul, Christiane
dc.contributor.authorInoue, Osamu
dc.contributor.authorOkagawa, Yutaka
dc.date.accessioned2021-10-22T20:25:09Z
dc.date.available2021-10-22T20:25:09Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25527
dc.sourceIIOimport
dc.titleHybrid overlay metrology with CDSEM in a BEOL patterning scheme
dc.typeProceedings paper
dc.contributor.imecauthorLeray, Philippe
dc.contributor.imecauthorJehoul, Christiane
dc.source.peerreviewyes
dc.source.beginpage942408
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXIX
dc.source.conferencedate22/02/2015
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2210946
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 9424


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