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Overlay metrology solutions in a triple patterning scheme

dc.contributor.authorLeray, Philippe
dc.contributor.authorMao, Ming
dc.contributor.authorBaudemprez, Bart
dc.contributor.authorAmir, Nuriel
dc.date.accessioned2021-10-22T20:25:27Z
dc.date.available2021-10-22T20:25:27Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25528
dc.sourceIIOimport
dc.titleOverlay metrology solutions in a triple patterning scheme
dc.typeProceedings paper
dc.contributor.imecauthorLeray, Philippe
dc.contributor.imecauthorMao, Ming
dc.contributor.imecauthorBaudemprez, Bart
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage94240E
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXIX
dc.source.conferencedate23/02/2015
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2212056
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 9424


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