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N-junctionless transistor prototype: manufacturing using a focused ion beam system

dc.contributor.authorLima, Lucas Petersen Barbosa
dc.contributor.authorPuydinger dos Santos, M.V.
dc.contributor.authorKeiler, M.A.
dc.contributor.authorDekkers, Harold
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorDiniz, Jose
dc.date.accessioned2021-10-22T20:36:35Z
dc.date.available2021-10-22T20:36:35Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25562
dc.sourceIIOimport
dc.titleN-junctionless transistor prototype: manufacturing using a focused ion beam system
dc.typeProceedings paper
dc.contributor.imecauthorDekkers, Harold
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecDekkers, Harold::0000-0003-4778-5709
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewyes
dc.source.beginpage61
dc.source.endpage70
dc.source.conferenceAdvanced CMOS-Compatible Semiconductor Devices 17
dc.source.conferencedate24/05/2015
dc.source.conferencelocationChicago, IL USA
dc.identifier.urlhttp://ecst.ecsdl.org/content/66/5/61.abstract
imec.availabilityPublished - imec
imec.internalnotesECS Transactions; Vol. 66, Issue 5


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