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Feasibility study of grapho-epitaxy DSA for complementing EUV lithography beyond N10

dc.contributor.authorLin, Chenxi
dc.contributor.authorZou, Yi
dc.contributor.authorAmbesi, Davide
dc.contributor.authorDruzhinina, Tamara
dc.contributor.authorWuister, Sander
dc.contributor.authorKarageorgos, Ioannis
dc.contributor.authorRyckaert, Julien
dc.contributor.authorRaghavan, Praveen
dc.contributor.authorGronheid, Roel
dc.date.accessioned2021-10-22T20:36:55Z
dc.date.available2021-10-22T20:36:55Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25563
dc.sourceIIOimport
dc.titleFeasibility study of grapho-epitaxy DSA for complementing EUV lithography beyond N10
dc.typeProceedings paper
dc.contributor.imecauthorRyckaert, Julien
dc.contributor.imecauthorGronheid, Roel
dc.source.peerreviewno
dc.source.conference1st International Symposium on DSA
dc.source.conferencedate26/10/2015
dc.source.conferencelocationLeuven Belgium
imec.availabilityPublished - imec


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