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Stress measurements in shallow trench isolation using μ-Raman spectroscopy

dc.contributor.advisortest3
dc.contributor.authorDombrowski, Kai
dc.contributor.authorDe Wolf, Ingrid
dc.date.accessioned2021-09-30T11:53:39Z
dc.date.available2021-09-30T11:53:39Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2556
dc.sourceIIOimport
dc.titleStress measurements in shallow trench isolation using μ-Raman spectroscopy
dc.typeProceedings paper
dc.contributor.imecauthorDe Wolf, Ingrid
dc.contributor.orcidimecDe Wolf, Ingrid::0000-0003-3822-5953
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage519
dc.source.endpage524
dc.source.conferenceBeam Injection Assessment of Defects in Semiconductors. 5th International Workshop (BIADS 98).; 30 Aug. - 3 Sept. 1998; Wulkow,
dc.source.conferencelocation
imec.availabilityPublished - imec


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