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Directed self-assembly (DSA) grapho-epitaxy template generation with immersion lithography

dc.contributor.authorMa, Yuansheng
dc.contributor.authorLei, Junjiang
dc.contributor.authorTorres, J. Andres
dc.contributor.authorHong, Le
dc.contributor.authorWord, James
dc.contributor.authorFenger, Germain
dc.contributor.authorTritchkov, Alexander
dc.contributor.authorLippincott, George
dc.contributor.authorGupta, Rachit
dc.contributor.authorLafferty, Neal
dc.contributor.authorHe, Yuan
dc.contributor.authorBekaert, Joost
dc.contributor.authorVandenberghe, Geert
dc.date.accessioned2021-10-22T20:45:26Z
dc.date.available2021-10-22T20:45:26Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25588
dc.sourceIIOimport
dc.titleDirected self-assembly (DSA) grapho-epitaxy template generation with immersion lithography
dc.typeProceedings paper
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage942306
dc.source.conferenceAlternative Lithographic Technologies VII
dc.source.conferencedate22/02/2015
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2210731
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 9423


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