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Directed self-assembly graphoepitaxy template generation with immersion lithography

dc.contributor.authorMa, Yuansheng
dc.contributor.authorLei, Junjiang
dc.contributor.authorTorres, J. Andres
dc.contributor.authorHong, Le
dc.contributor.authorWord, James
dc.contributor.authorFenger, Germain
dc.contributor.authorTritchkov, Alexander
dc.contributor.authorLippincott, George
dc.contributor.authorGupta, Rachit
dc.contributor.authorLafferty, Neal
dc.contributor.authorHe, Yuan
dc.contributor.authorBekaert, Joost
dc.contributor.authorVandenberghe, Geert
dc.date.accessioned2021-10-22T20:45:48Z
dc.date.available2021-10-22T20:45:48Z
dc.date.issued2015
dc.identifier.issn1932-5150
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25589
dc.sourceIIOimport
dc.titleDirected self-assembly graphoepitaxy template generation with immersion lithography
dc.typeJournal article
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.identifier.doi10.1117/1.JMM.14.3.031216
dc.source.peerreviewyes
dc.source.beginpage31216
dc.source.journalJournal of Micro/Nanolithography MEMS and MOEMS
dc.source.issue3
dc.source.volume14
imec.availabilityPublished - imec


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