dc.contributor.author | Mallik, Arindam | |
dc.contributor.author | Ryckaert, Julien | |
dc.contributor.author | Mercha, Abdelkarim | |
dc.contributor.author | Verkest, Diederik | |
dc.contributor.author | Ronse, Kurt | |
dc.contributor.author | Thean, Aaron | |
dc.date.accessioned | 2021-10-22T20:50:04Z | |
dc.date.available | 2021-10-22T20:50:04Z | |
dc.date.issued | 2015 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/25602 | |
dc.source | IIOimport | |
dc.title | Maintaining Moore's law: enabling cost-friendly dimensional scaling | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Mallik, Arindam | |
dc.contributor.imecauthor | Ryckaert, Julien | |
dc.contributor.imecauthor | Mercha, Abdelkarim | |
dc.contributor.imecauthor | Verkest, Diederik | |
dc.contributor.imecauthor | Ronse, Kurt | |
dc.contributor.imecauthor | Thean, Aaron | |
dc.contributor.orcidimec | Mallik, Arindam::0000-0002-0742-9366 | |
dc.contributor.orcidimec | Mercha, Abdelkarim::0000-0002-2174-6958 | |
dc.contributor.orcidimec | Verkest, Diederik::0000-0001-6567-2746 | |
dc.contributor.orcidimec | Ronse, Kurt::0000-0003-0803-4267 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 94221N | |
dc.source.conference | Extreme Ultraviolet (EUV) Lithography VI | |
dc.source.conferencedate | 22/02/2015 | |
dc.source.conferencelocation | San Jose, CA USA | |
dc.identifier.url | 10.1117/12.2086085 | |
imec.availability | Published - imec | |
imec.internalnotes | Proceedings of SPIE; Vol. 9422 | |