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Deposition of MnO anode And MnO2 cathode thin films by plasma enhanced atomic layer deposition using the Mn(thd)3 precursor

dc.contributor.authorMattelaer, Felix
dc.contributor.authorVereecken, Philippe
dc.contributor.authorDendooven, Jolien
dc.contributor.authorDetavernier, Christophe
dc.date.accessioned2021-10-22T20:59:44Z
dc.date.available2021-10-22T20:59:44Z
dc.date.issued2015
dc.identifier.issn0897-4756
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25629
dc.sourceIIOimport
dc.titleDeposition of MnO anode And MnO2 cathode thin films by plasma enhanced atomic layer deposition using the Mn(thd)3 precursor
dc.typeJournal article
dc.contributor.imecauthorVereecken, Philippe
dc.contributor.orcidimecVereecken, Philippe::0000-0003-4115-0075
dc.source.peerreviewyes
dc.source.beginpage3628
dc.source.endpage3635
dc.source.journalChemistry of Materials
dc.source.issue10
dc.source.volume27
dc.identifier.urlhttp://pubs.acs.org/doi/abs/10.1021/acs.chemmater.5b00255
imec.availabilityPublished - imec


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