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Monolithic integration of III-V semiconductors by selective area growth on Si(001) substrate: epitaxy challenges & applications

dc.contributor.authorMerckling, Clement
dc.contributor.authorJiang, Sijia
dc.contributor.authorLiu, Ziyang
dc.contributor.authorWaldron, Niamh
dc.contributor.authorBoccardi, Guillaume
dc.contributor.authorRooyackers, Rita
dc.contributor.authorWang, Zhechao
dc.contributor.authorTian, Bin
dc.contributor.authorPantouvaki, Marianna
dc.contributor.authorCollaert, Nadine
dc.contributor.authorVan Campenhout, Joris
dc.contributor.authorHeyns, Marc
dc.contributor.authorVan Thourhout, Dries
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorThean, Aaron
dc.date.accessioned2021-10-22T21:03:54Z
dc.date.available2021-10-22T21:03:54Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25640
dc.sourceIIOimport
dc.titleMonolithic integration of III-V semiconductors by selective area growth on Si(001) substrate: epitaxy challenges & applications
dc.typeProceedings paper
dc.contributor.imecauthorMerckling, Clement
dc.contributor.imecauthorWaldron, Niamh
dc.contributor.imecauthorBoccardi, Guillaume
dc.contributor.imecauthorPantouvaki, Marianna
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.imecauthorVan Campenhout, Joris
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorVan Thourhout, Dries
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorThean, Aaron
dc.contributor.orcidimecMerckling, Clement::0000-0003-3084-2543
dc.contributor.orcidimecBoccardi, Guillaume::0000-0003-3226-4572
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.contributor.orcidimecVan Campenhout, Joris::0000-0003-0778-2669
dc.contributor.orcidimecVan Thourhout, Dries::0000-0003-0111-431X
dc.source.peerreviewyes
dc.source.beginpage107
dc.source.endpage116
dc.source.conferenceSilicon Compatible Materials, Processes, and Technologies for Advanced Integrated Circuits and Emerging Applications 5
dc.source.conferencedate24/05/2015
dc.source.conferencelocationChicago, IL USA
dc.identifier.urlhttps://doi.org/10.1149/06604.0107ecst
imec.availabilityPublished - imec
imec.internalnotesECS Transactions; Vol. 66, Issue 4


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