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Modeling and tackling resistivity scaling in metal nanowires

dc.contributor.authorMoors, Kristof
dc.contributor.authorSoree, Bart
dc.contributor.authorMagnus, Wim
dc.date.accessioned2021-10-22T21:13:46Z
dc.date.available2021-10-22T21:13:46Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25667
dc.sourceIIOimport
dc.titleModeling and tackling resistivity scaling in metal nanowires
dc.typeProceedings paper
dc.contributor.imecauthorSoree, Bart
dc.contributor.imecauthorMagnus, Wim
dc.contributor.orcidimecSoree, Bart::0000-0002-4157-1956
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage222
dc.source.endpage225
dc.source.conferenceInternational Conference on Simulation of Semiconductor Processes and Devices - SISPAD
dc.source.conferencedate9/09/2015
dc.source.conferencelocationWashington DC USA
dc.identifier.urlhttp://ieeexplore.ieee.org/xpl/articleDetails.jsp?arnumber=7292299
imec.availabilityPublished - open access


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