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Optimization of an advanced positive DUV resist for 248 nm L/S pattern printing

dc.contributor.authorErcken, Monique
dc.contributor.authorPollers, Ingrid
dc.contributor.authorVan Puyenbroeck, Ilse
dc.contributor.authorGoethals, Mieke
dc.contributor.authorRonse, Kurt
dc.contributor.authorPawlowski, G.
dc.contributor.authorSpiess, Walter
dc.date.accessioned2021-09-30T11:55:45Z
dc.date.available2021-09-30T11:55:45Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2566
dc.sourceIIOimport
dc.titleOptimization of an advanced positive DUV resist for 248 nm L/S pattern printing
dc.typeOral presentation
dc.contributor.imecauthorErcken, Monique
dc.contributor.imecauthorRonse, Kurt
dc.source.peerreviewno
dc.source.conferenceMNE 98 - Micro- and Nano-Engineering Conference; 22-24 Sept. 1998; Leuven, Belgium.
dc.source.conferencelocation
imec.availabilityPublished - imec


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