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Lithographic process simulation for scanners

dc.contributor.authorErdmann, A.
dc.contributor.authorArnz, M.
dc.contributor.authorMaenhoudt, Mireille
dc.contributor.authorBaselmans, J.
dc.contributor.authorvan Osnabrugge, J.C.
dc.date.accessioned2021-09-30T11:55:57Z
dc.date.available2021-09-30T11:55:57Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2567
dc.sourceIIOimport
dc.titleLithographic process simulation for scanners
dc.typeProceedings paper
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage164
dc.source.endpage175
dc.source.conferenceOptical Microlithography X
dc.source.conferencedate25/02/1998
dc.source.conferencelocationSanta Clara CA, USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 3334


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